ASML’s first high-NA tool is almost ready for action

Chipmakers will soon be able to try their hand at high-NA EUV lithography. As the assembly of the world’s first fully functioning high-NA tool nears completion, the High-NA Lab in Veldhoven will be ready to receive customers in Q1, ASML’s head of high-NA product development Greet Storms told reporters on Friday.

Offering access as soon as the first new-generation tool becomes available is a lesson learned from the previous lithography transition, Storms said. Precious time is saved by putting the EXE:5000 pre-production system to work in Veldhoven as soon as it’s completed, instead of shipping it to long-standing partner Imec in Leuven, which usually would be the first to receive next-gen lithography equipment. All in all, this strategy will save about a year.