Second high-NA tool goes to Intel as well

Intel is in the process of receiving a second high-NA EUV tool from ASML in its Oregon development fab, CEO Pat Gelsinger told analysts last week. After the Veldhoven-based firm had started shipping of the first next-gen EUV system last December, ASML said in July that shipping of a second tool had started, but it wasn’t clear to which customer. That tool is operational by now. Gelsinger said development of future nodes 18A, 14A and 10A was “showing good early indicators.” The preceding Intel 4 and Intel 3 nodes, which were originally scheduled to ramp in Oregon, have been transferred to Ireland sooner than anticipated to free up resources for the Technology Development team in Oregon, Gelsinger said.