SALD set to expand horizon of atomic layer deposition

In the world of materials deposition, nothing trumps atomic layer deposition (ALD) when it comes to precision. The technique offers control over film thickness and composition at the atomic level, while completely following the contours of a surface. This precision comes at a price, though: in its traditional form, ALD is incompatible with a continuous process. This limits the manufacturing volumes that can be handled cost-effectively, rendering ALD unsuitable for a large number of commercial applications.

SALD has set out to change that. The company founded in 2019 has developed equipment for continuous ALD on a wide range of substrates, enabling a number of industries that previously wouldn’t dream of using ALD to apply the deposition technology. “We’re working with companies and research institutes from all over the world to see how they can take advantage of ALD’ed functional nanolayers,” says Peter Visser, business developer at SALD.