ASML and Imec team up for sub-2nm development

ASML will install a full suite of its most advanced tools in Imec’s cleanroom to support the development of sub-2nm process technology. The pilot line in Leuven will include the latest model high-NA scanner (Twinscan EXE:5200), the latest models 0.33 NA EUV (Twinscan NXE:3800) and DUV immersion (Twinscan NXT:2100i) systems and the Yieldstar optical and HMI multi-beam metrology tools. “This commitment from ASML, which builds on over 30 years of successful collaboration, sends a powerful signal of our unwavering dedication to drive the advancement of sub-nanometer chip technology,” comments Luc Van den hove.

The move expands an existing collaboration to set up the joint high-NA lab (link in Dutch), which will receive the first high-NA EUV scanner (the Twinscan EXE:5000) that’s currently being assembled. By keeping this tool in Veldhoven, work to integrate it into commercial semiconductor manufacturing can commence as quickly as possible.

The partners have submitted a request for IPCEI funding, which allows EU member states to bypass state aid rules for strategically relevant activities such as chip production. The European Commission has OK’ed the proposal, the Dutch government is currently reviewing it.